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John G. Webster (Editor) 's 54.Semiconductor Manufacturing PDF

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Extra info for 54.Semiconductor Manufacturing

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Applications of CVD span many important industries from metallurgical applications to hard coatings for wear resistance and corrosion protection of special tools. Morphology, lateral and vertical growth rates, composition, stress, uniformity, and electrical and optical properties can all be modified and controlled through alterations in the chemistry and reactor conditions. A large variety of crystalline and amorphous elements and compounds, in bulk form, as coatings and thin films, can be synthesized by this method, usually at a relatively low temperature and with a high degree of purity and controlled microstructure.

This development requires a certain length of reactor that depends on the gas properties, pressure, velocity, and composition. The provision required for a welldeveloped and stable fluid flow behavior is a critical design consideration for many reactor designs. MIXED CONVECTION PHENOMENA The superimposition of buoyancy-driven flows due to gasphase density gradients, resulting from temperature gradients as well as compositional variations on the forced flow entering the reactor leads to a mixed convection type of flow.

L. Artificial Neural-NetworkBased Diagnosis of CVD Barrel Reactor. IEEE Trans. Semiconductor Manufactur. 2002, 15, pp 71–78. 35. Salam, F. ; Asmussen, J. Modeling of a Plasma Processing Machine for Semiconductor Wafer Etching Using Energy-Functions-Based Neural Networks. IEEE Trans. Control Syst. Technol. 1997, 5, pp 598– 613. 36. ; May, G. S. Reactive Ion Etch Modeling Using Neural Networks and Simulated Annealing. IEEE Trans. Components, Packaging, Manufactur. Technol. C 1996, 19, pp 3–8. 37. ; Kwon, K.

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54.Semiconductor Manufacturing by John G. Webster (Editor)


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