By Ingo Pinnau and Benny D. Freeman (Eds.)
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Extra info for Advanced Materials for Membrane Separations
Ch002 34 with solid-state deuterium N M R results (47). O f the four polysilanes, methyl group mobility is the most restricted for P c H M S i that also has the smallest diffusion coefficient. Comparison of the non-methyl groups V A C F s in Figure 5 indicates that the phenyl group of PPhMSi and the cyclohexyl group of P c H M S i are the least mobile while the propyl group of P P r M S i is the most mobile. Simulation results show that the phenyl groups of P P h M S i are arranged in parallel, allowing maximum overlap (46), while the cyclohexyl groups o f P c H M S i reside in the chair conformation.
The ith Si-atom) with the O-atom of the adjacent repeating unit. For P D M S M , it was defined as Si(/)-C(/)~Si(i+l)--C(/+l), a vector connecting one Si-atom with the C-atom of the adjacent repeating unit. Vectors were also assigned to the five different substituent groups — methyl, «-propyl, trifluoropropyl, phenyl, and cyclohexyl. , a vector connecting one Si-atom with a H-atom o f the methyl group o f the adjacent Si-atom); Si(i)-Si(/+l)-C(Ar)-H for phenyl (connecting one Si-atom with the H-atom located at the /^-position of the phenyl group attached to the adjacent Si-atom); Si(i)-Si(i+l)-C(cH)-H for cyclohexyl (connecting one S i atom with the H-atom located at the p-position of the cyclohexyl group attached to the adjacent Si-atom); and Si(/)-Si(/+l>-C(terminal)--H for fi-propyl (connecting one Si-atom with the H-atom located at the terminal C-atom of the propyl group attached to the adjacent Si-atom); and Si(/)-Si(/+l)-C(terminal)-F for trifluoropropyl (connecting one Si-atom with a F-atom located at the terminal position of the trifluoropropyl group attached to the adjacent Si-atom).
2000, 38, 3-24. 17. Lin, Y . ; Nair, B . ; Alsyouri, H . Sep. Purif. Methods 2002, 31, 229-379. 18. Shelekhin, A . ; Dixon, A . ; Ma, Y . H . AIChEJ. 1995, 41, 58-67. 19. ; Koros, W. J. Ind. Eng. Chem. Res. 2000, 39, 2692-2696. 20. Pechar, T. ; Davis, R. Desalination 2002, 146, 3-9. 21. ; Marand, E . Sep. Purif. Tech. 2001, 25, 181193. 22. ; Wessling, M. AIChEJ. 2001, 47, 10881093. 23. White, L. ; Blinka, T. ; Kloczewski, H . ; Wang, I. J. Membrane Sci. 1995, 103, 73-82. 24. Lee, S. ; Minhas, B.
Advanced Materials for Membrane Separations by Ingo Pinnau and Benny D. Freeman (Eds.)